American Journal of Modern Physics
Volume 7, Issue 5, September 2018, Pages: 185-193
Received: Nov. 10, 2016;
Accepted: Mar. 24, 2017;
Published: Dec. 5, 2018
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Md. Ziaur Rahman, Department of Civil Engineering, Dhaka International University, Dhaka, Bangladesh
Mohammed Mynuddin, Department of Electrical & Electronics Engineering, Georgia Southern University, Statesboro, USA
This model describes the production and destruction mechanism of nitrogen plasma at atmospheric pressure. We have studied the mechanisms of chemical dissociation, ionization, ion conversion and recombination in nitrogen plasmas, with kinetic temperature (Tg) of the free electrons being higher than the kinetic temperature (Tg) of heavy species. Therefore, the investigation of nitrogen plasma species in a wide range of pressure from 1 Torr to 760 Torr is interesting phenomena for obtaining the equilibrium state when the nitrogen species breakdown. In order to calculate the species densities to reach thermodynamic equilibrium under various conditions, a set of chemical kinetic reactions of nitrogen under consideration have been simulated. It solves the particle balance equations for a set of interacting species. In this study 16 reactions and 4 species of Nitrogen N, N2, N+, N2+ and electron have been considered. The densities of the charged and neutral species are modeled by continuity equations which includes the relevant plasma-chemical kinetics. Nitrogen species density is guided by continuity equation where chemical processes and Arrhenius form are used to follow the change of species density over the time. To calculate the species densities over pressure, temperature and time the continuity equations of the 16 reactions for the 5 species under consideration giving their initial pressure, densities and temperatures, with the latter held constant have been solved. The variations of species densities have been investigated as a function of pressure ranging from 1 to 760 Torr. This model shows that as the pressure is increased the species densities of nitrogen plasma also increase from pressure 1 to 200 Torr and after pressure above 200 Torr the species densities become almost saturated. The change of species densities at various temperatures ranging from 2000 Kelvin to 25000 Kelvin is successfully investigated. The destruction and production rates of the nitrogen species also have been calculated within the time ranging from 0 to 19nS and it shows that the density of nitrogen plasma increases with time. In our study we have considered the gas and electron temperature as 10k Kelvin and 4eV respectively.
Md. Ziaur Rahman,
Kinetic Modelling of Atmospheric Pressure Nitrogen Plasma, American Journal of Modern Physics.
Vol. 7, No. 5,
2018, pp. 185-193.
Bell, A. T., in Techniques and Applications of Plasma Chemistry, eds. John R. Hollahan and Alexis T. Bell, p. 1. New York: John Wiley & Sons, 1974.
Concepts of modern physics, Beiser,( 5th edition) Tata McGraw-Hill(1997)
T. Vijayan and Jagadish G. Patil, IEEE Transactions on plasma science,vol. 39, No. 11, November 2011.
B. Chapman, Glow discharge processes, A Wiley-Interscience publication, John Wiley & Sons, New York.
E. E. Ferguson, F. C. Fehsenfeld, and A. L. Schmeltekopf, Phys. Rev. A, Vol. 138, 381 - 385, 1965.
Flannery, M. R. (1980), Charge transfer in three-body ion-ion recombination at low gas densities. Int. J. Quantum Chem., 18: 477–482. doi:10.1002/qua.560180850
Physics Department, University of Pittsburgh, Pittsburgh, Pennsylvania 15213 Received December 17, 1968
Plasma Kinetics in Atmospheric Gases, MCaitelli C.M. Ferreira B. F Gordiets A. I. Osipov.
N. L. Aleksandrov Usp. Fiz. Nauk 154, 177-206 (February 1988)
M. A. Lieberman, J. Appl. Phys. 65, 4186 (1989).
E. Kawamura, V. Vahedi, M.A. Lieberman and C. K. Birdsall, Plasma Sources Sci. Technol. 8, R45 (1999).
F. A. Haas and N. St J Braithwaite, Plasma Sources Sci. Technol. 9, 77 (2000).
E. Gogolides and H. H. Sawin, J. Appl. Phys. 72, Vol. 9, 3971 - 3987, 1992.
R. Veerasingam, R. B. Campbell and R. T. McGrath, Plasma Sources Sci. Technol. 6, 15 169, 1997.
X. M. Zhu and M. G. Kong, J. Appl. Phys. 97, 083301, 2005.
T. J. Sommerer and M. J. Kushner J. Appl. Phys. Vol. 71, No. 4, 15 February 1992.
Yasunori Tanaka, TMichishitia and Y Uesugi,Plasma Sources Sc. Technol.14(2005) 137,doi:10.1088/0963-0252/14/1/016.
Ph Teulet, J J Gonzalez, A Mercado-Cabrera, Y Cressault and A Gleizes, J. Phys. D: Appl. Phys. 42 (2009) 175201 (15pp)
R. J. Shul S. J. Pearton (Eds) Hand book of plasma processing techniques
Plasma Physics and Engineering, Alexander Fridman and Lawrence A. Kennedy, Published in 2004 by Taylor & Francis 29 West 35th Street New York, NY 10001-2299.