Investigation on Optical Behaviour of Hippuric Acid for Optoelectronics Applications
American Journal of Optics and Photonics
Volume 2, Issue 5, October 2014, Pages: 65-68
Received: Sep. 16, 2014; Accepted: Sep. 27, 2014; Published: Oct. 30, 2014
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Authors
Suresh Sagadevan, Department of Physics, Sree Sastha Institute of Engineering and Technology, Chennai-600 123, India
Priya Murugasen, Department of Physics, Saveetha Engineering College, Chennai, India
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Abstract
In present investigation Hippuric Acid (HA) crystal has been grown by slow evaporation technique. The crystalline nature of the grown crystal was confirmed using single X-ray diffraction technique. The optical studies were carried to examine optical transparency and determine the optical constants of the grown crystal quenching the optoelectronics applications. The grown crystal was subjected to optical studies. The optical studies ascertained high optical transparency and cut off wavelength was found to be 300 nm very important for nonlinear applications. The optical band gap of grown crystal is found to be 4.14 eV. The optical constants such as extinction coefficient, refractive index, optical band gap, and reflectance were calculated. The observed etch patterns confirm the layer growth mechanism.
Keywords
Growth from Solution, Hippuric Acid, Single XRD, Nonlinear Optics, Optical Properties
To cite this article
Suresh Sagadevan, Priya Murugasen, Investigation on Optical Behaviour of Hippuric Acid for Optoelectronics Applications, American Journal of Optics and Photonics. Vol. 2, No. 5, 2014, pp. 65-68. doi: 10.11648/j.ajop.20140205.11
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