Home / Journals American Journal of Modern Physics / Issue III: Foundations of Hadronic Chemistry
Issue III: Foundations of Hadronic Chemistry
Submission Deadline: Aug. 31, 2017
Lead Guest Editor
Richard Anderson
Board of Trustees, The R. M. Santilli Foundation, Palm Harbor, Florida, USA
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Guidelines for Submission
Manuscripts can be submitted until the expiry of the deadline. Submissions must be previously unpublished and may not be under consideration elsewhere.
Papers should be formatted according to the guidelines for authors (see: http://www.sciencepublishinggroup.com/journal/guideforauthors?journalid=122). By submitting your manuscripts to the special issue, you are acknowledging that you accept the rules established for publication of manuscripts, including agreement to pay the Article Processing Charges for the manuscripts. Manuscripts should be submitted electronically through the online manuscript submission system at http://www.sciencepublishinggroup.com/login. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal and will be listed together on the special issue website.
Published Papers
1
Authors: Richard Anderson
Pages: 1-16 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.11
Views 1798 Downloads 91
2
Authors: Sachin S. Wazalwar, Vijay M. Tangde
Pages: 78-84 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.17
Views 1682 Downloads 84
3
Authors: Chandrashekhar P. Pandhurnekar, Sangesh P. Zodape
Pages: 64-77 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.16
Views 1543 Downloads 84
4
Authors: Jeremy Dunning-Davies, Richard Norman, Ruggero Maria Santilli
Pages: 46-52 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.14
Views 1626 Downloads 69
5
Authors: Anil A. Bhalekar, Ruggero M. Santilli
Pages: 85-104 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.18
Views 1801 Downloads 78
6
Authors: Richard Lawrence Norman, Jeremy Dunning-Davies
Pages: 105-109 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.19
Views 1580 Downloads 70
7
Authors: Ruggero Maria Santilli
Pages: 53-63 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.15
Views 1634 Downloads 83
8
Authors: Richard Norman, Anil A. Bhalekar, Simone Beghella Bartoli, Brian Buckley, Jeremy Dunning-Davies, Jan Rak, Ruggero M. Santilli
Pages: 29-45 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.13
Views 1684 Downloads 78
9
Authors: Vijay M. Tangde, Sachin S. Wazalwar
Pages: 17-28 Published Online: Sep. 26, 2017
DOI: 10.11648/j.ajmp.s.2017060401.12
Views 1702 Downloads 88
Introduction
In continuation of the preceding two special issues on the Foundations of Haronic Mathematics and the Foundations of Hadronic Mechanics the present third special issue is devoted to the Foundations of Hadronic Chemistry. By noting that quantum chemistry cannot provide a quantitative representation of the attraction between two identical valence electrons in singlet coupling, the Italian-American scientist R. M. Santilli initiated the construction of a covering of quantum chemistry under the name of hadronic chemistry, which is solely valid at one Fermi mutual distance of valence electrons while recovering quantum chemistry identically and uniquely at larger distances. Thanks also to the collaboration of numerous chemists, hadronic chemistry has now achieved applications and experimental verification in superconductivity, molecular structure, chemical reactions, biological systems and other fields.

It should also be indicated that various companies are now regularly manufacturing and selling products based on Hadronic Mathematics, Physics and Chemistry, such as Magnegas Corporation, a U. S. public company whose stock is traded under the symbol MNGA, and its subsidiaries in Italy, Australia and China, that produced new environmentally friendly fuels with a new chemical structure solely permitted by hadronic chemistry.

This special issue of AJMP would outline the above described advances in hadronic chemistry with an emphasis on its emerging basic and industrial applications.
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